EB Mask Writer EBM-9500 | Product Information - NuFlare …
Variable EB Mask Writer system "EBM-9500PLUS" for 7nm+/5nm node. 1) 50kV acceleration voltage enables writing in greater contrast. 2) Multiple pass writing method improves the performance of shot stitching.
EB Mask Writer | Product Information | NuFlare Technology, Inc.
Electron beam mask writers precisely position the electrons to write complex circuit patterns on the photomask with an accuracy of a nanometer-order scale.
We developed EBM-9500PLUS for 7nm+ tn generation. Charging Effect Reduction (CER) technology is newly introduced to improve Image Placement error with high-density layouts. CER achieves image placement performance equivalent to CDL performance. Nuflare confirmed performance of EBM-9500PLUS. EBM-9500PLUS meets standard specification. Local CD ...
Electron beam mask writer EBM-9500 for logic 7nm node generation
Oct 25, 2016 · It is designed to realize better resolution and higher throughput than EBM-9500, our latest variable-shaped-beam writer, at shot count higher than 500 Gshot/pass.
Big Changes In Patterning - Semiconductor Engineering
Feb 22, 2017 · Fujimura: The NuFlare EBM-9500, which is writing most leading-edge masks today, has a GPU-accelerated mechanism in it. It’s simulating the temperature of every part of the mask as you write these shots.
Electron beam mask writer EBM-9500 for logic 7nm node generation
A newly introduced electron beam source enables higher current density of 1200A/cm 2 . Heating effect correction function has also been newly introduced to satisfy the requirements for both pattern accuracy and throughput. In this paper, we will report the configuration and performance of …
Electron beam mask writer EBM-9500 for logic 7nm node …
Oct 25, 2016 · A newly introduced electron beam source enables higher current density of 1200A/cm 2 . Heating effect correction function has also been newly introduced to satisfy the requirements for both pattern accuracy and throughput. In this paper, we will report the configuration and performance of EBM-9500.
NuFlare Technology Inc - Semiconductor Materials and Equipment
The EB Mask Writer system "EBM-9500" with enhanced placement accuracy is suitable for developing next generation photo-masks. 1) 50kV acceleration voltage enables greater contrast writing. 2) Multiple pass writing method improves the performance of shot stitching.
Inside Photomask Writing - Semiconductor Engineering
Jan 19, 2017 · This, in turn, impacts mask write times, at least for the most complex photomasks at the leading edge. To address those issues, NuFlare has introduced a new and faster VSB tool at each node. Each VSB tool has a higher current density. The existing VSB tool, the EBM-9500, is aimed for the 7nm node and has a current density of 1,200A/cm2.
可变成型电子束掩膜光刻设备 EBM-9500PLUS | 产品信息 | 株式会 …
这是紐富来科技的产品信息｡刊登有电子束掩模曝光设备 EBM-9500PLUS的信息｡.