Atomic Layer Deposition (ALD ... films revealed that the substrate type, deposition temperature, and film thickness significantly influence the crystallization process and the resulting optical ...

Atomic Layer Deposition (ALD) is a highly controlled ... a hydrogen-free metal-organic precursor and nitrogen plasma at low temperatures (100–300 °C). This approach resulted in films with ...

ALTUS Halo is the newest addition to Lam's ALTUS product family and is part of a differentiated product portfolio that ...

Lam Research (LRCX) unveiled ALTUS Halo, an atomic layer deposition tool that harnesses the capabilities of the metal molybdenum in the ...

A powerful method co-invented/developed in the lab is to use atomic layer ... reactors and high temperature thermogravimetric analyzers. Novel surface science characterization of low – cycle (less ...

system with a low-frequency plasma source. The device achieved a slightly higher efficiency than a reference device fabricated via more expensive atomic layer deposition (ALD). The group built a ...