Determining the ideal etch conditions to remove rough areas of the line and space resist pattern after EUV exposure.

Advancing Focused Ion Beam Technology for Semiconductor Innovation Failure Analysis and Counterfeit Detection. • Expanding Focused Ion Beam Applications in Nanotechnology Biomedical Research ...

A study in Advanced Materials explores how interfacial adhesion affects lithium plating behavior in anode-free solid-state ...

Purchase of Advanced Quantum Cluster PVD System from Angstrom Engineering strengthens hub’s position in next-gen tech sectors ...

Immunomodulation based on macrophages shows great potential in tackling major diseases such as infections and cancers.

Engineers from Ohio State University are claiming to have opened the door to the fabrication of far smaller AlN/GaN HEMTs operating at much higher frequencies. The team’s breakthrough involves the ...

An analysis of the Switch 2 processor confirms many rumors. There is now also clarity regarding Samsung's manufacturing process.

After obtaining the motherboard, Geekerwan analyzed the accessories using an IR (infrared) microscope and a FIB-SEM (focused ion beam scanning electron microscope). Next, we will look at the ...

Charging electric-vehicle batteries in Ithaca's frigid winter can be tough, and freezing temperatures also decrease the ...