The Korea Research Institute of Standards and Science (KRISS) has successfully developed a system that diagnoses the lifetime ...

Dr. Ho Jin Ma's research team from the Nano Materials Research Division at the Korea Institute of Materials Science (KIMS), ...

A research team has successfully developed a new composition and processing technology for transparent plasma-resistant ...

However, the process, known as reactive ion etching, isn't fully understood and could be improved. One recent development involves keeping the wafer––the sheet of semiconductor material to be ...

Standard NAND flash storage is used in microSD cards, USB drives, and solid-state drives in computers and phones. To fit more gigabytes into smaller spaces, manufacturers ...

Researchers find a faster way to etch deep holes for 3D NAND Plasma-based cryo-etching technique doubles etch speed, ...

Lam Research Corp. has rolled out what it claims is an advanced plasma conductor etch tool needed for 3D chipmaking. Called ...

The photon detection technique has several applications. Fractal superconducting nanowire single-photon detectors (SNSPDs) ...

Akara® Solves Key Scaling Challenges for Chipmakers, with Unique Plasma Control Capabilities and a Suite of Proprietary New Technologies; Extends 20 years of Conductor Etch Leadership FREMONT, Calif.

The plasma process involves precisely etching the surface of a semiconductor substrate or depositing a specific material using a gas ionized into a plasma state. The plasma process is considered a ...

The researchers compared results from this process to a more advanced cryo-etching process that uses hydrogen fluoride gas to create the plasma. "Cryo etch with the hydrogen fluoride plasma showed ...