Lam Research Corp. has rolled out what it claims is an advanced plasma conductor etch tool needed for 3D chipmaking. Called ...

Lam Research Corp. (Nasdaq: LRCX) today introduced Akara®, a breakthrough innovation in plasma etch and the most advanced ...

The researchers compared results from this process to a more advanced cryo-etching process that uses hydrogen fluoride gas to create the plasma. "Cryo etch with the hydrogen fluoride plasma showed ...

Dr. Ho Jin Ma's research team from the Nano Materials Research Division at the Korea Institute of Materials Science (KIMS), ...

New Lam Research tools Akara and ALTUS Halo for building AI chips offer advanced plasma etch and ALD capabilities for complex ...

A research team has successfully developed a new composition and processing technology for transparent plasma-resistant ...

Researchers find a faster way to etch deep holes for 3D NAND Plasma-based cryo-etching technique doubles etch speed, ...

The Korea Research Institute of Standards and Science (KRISS) has successfully developed a system that diagnoses the lifetime ...

Today's introductions of Akara and the separately announced ALTUS Halo, the world's first molybdenum atomic layer deposition ...

Akara extends decades of Lam leadership in conductor etch. This includes multiple generations of the company's highly ...

FREMONT, Calif., Feb. 19, 2025 /PRNewswire/ -- Lam Research Corp. (Nasdaq: LRCX) today introduced Akara®, a breakthrough innovation in plasma etch and the most advanced conductor etch tool available.