Atomic Layer Deposition (ALD ... films revealed that the substrate type, deposition temperature, and film thickness significantly influence the crystallization process and the resulting optical ...
Atomic Layer Deposition (ALD) is a highly controlled ... a hydrogen-free metal-organic precursor and nitrogen plasma at low temperatures (100–300 °C). This approach resulted in films with ...
A new technical paper titled “Facilitating Small-Pitch Interconnects with Low-Temperature Solid-Liquid Interdiffusion Bonding ...
Lam Research (LRCX) unveiled ALTUS Halo, an atomic layer deposition tool that harnesses the capabilities of the metal molybdenum in the ...
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